Extreme ultraviolet light generation apparatus and control method for laser apparatus in extreme ultraviolet light generation system

ABSTRACT

An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range.

CROSS-REFERENCE TO A RELATED APPLICATION

The present application claims priority from Japanese Patent ApplicationNo. 2013-114964, filed May 31, 2013.

BACKGROUND

1. Technical Field

The present disclosure relates to apparatuses for generating extremeultraviolet light and to control methods for laser apparatuses inextreme ultraviolet light generation systems.

2. Related Art

In recent years, semiconductor production processes have become capableof producing semiconductor devices with increasingly fine feature sizes,as photolithography has been making rapid progress toward finerfabrication. In the next generation of semiconductor productionprocesses, microfabrication with feature sizes at 60 nm to 45 nm, andfurther, microfabrication with feature sizes of 32 nm or less will berequired. In order to meet the demand for microfabrication with featuresizes of 32 nm or less, for example, an exposure apparatus is needed inwhich a system for generating EUV light at a wavelength of approximately13 nm is combined with a reduced projection reflective optical system.

Three kinds of systems for generating EUV light are known in general,which include a Laser Produced Plasma (LPP) type system in which plasmais generated by irradiating a target material with a laser beam, aDischarge Produced Plasma (DPP) type system in which plasma is generatedby electric discharge, and a Synchrotron Radiation (SR) type system inwhich orbital radiation is used to generate plasma.

SUMMARY

An extreme ultraviolet light generation apparatus according to oneaspect of the present disclosure may be an extreme ultraviolet lightgeneration apparatus that generates extreme ultraviolet light byirradiating a target with a pulse laser beam and producing plasma. Theextreme ultraviolet light generation apparatus may include a chamber, atarget supply device, a target detection unit, and a laser controller.The chamber may contain a plasma generation region irradiated by a pulselaser beam from a laser apparatus. The target supply device may beconfigured to supply a plurality of targets consecutively to the plasmageneration region in the chamber. The target detection unit may beconfigured to detect a target outputted from the target supply devicethat has passed a predetermined position between the target supplydevice and the plasma generation region. The laser controller may beconfigured to control the laser apparatus. The laser controller maygenerate a light emission trigger instructing a laser device included inthe laser apparatus to emit a pulse laser beam, and may output thegenerated light emission trigger to the laser apparatus, in accordancewith a detection signal from the target detection unit indicating that atarget has been detected. The laser controller may adjust generation ofthe light emission trigger outputted consecutively to the laserapparatus so that a time interval of the light emission trigger iswithin a predetermined range.

BRIEF DESCRIPTION OF THE DRAWINGS

Hereinafter, selected embodiments of the present disclosure will bedescribed with reference to the accompanying drawings.

FIG. 1 schematically illustrates an exemplary configuration of an LPPtype EUV light generation system.

FIG. 2 is a partial cross-sectional view illustrating the configurationof an EUV light generation system.

FIG. 3 is a block diagram illustrating control of a target supply deviceand a laser apparatus performed by an EUV light generation controller.

FIG. 4 schematically illustrates a comparative example of theconfiguration of a laser controller.

FIG. 5A illustrates an example of timing charts indicating signals froma light emission trigger signal generation unit indicated in FIG. 4.

FIG. 5B illustrates an example of timing charts indicating signals froma light emission trigger signal generation unit indicated in FIG. 4.

FIG. 6 schematically illustrates an example of the configuration of alaser controller and a laser apparatus according to a first embodiment.

FIG. 7 illustrates an example of timing charts indicating signals from alight emission trigger signal generation unit indicated in FIG. 6,according to the first embodiment.

FIG. 8 schematically illustrates another example of the configuration ofa laser controller and a laser apparatus according to the firstembodiment.

FIG. 9 illustrates an example of timing charts indicating signals from alight emission trigger signal generation unit indicated in FIG. 8,according to the first embodiment.

FIG. 10 schematically illustrates an example of the configuration of alaser controller and a laser apparatus according to a second embodiment.

FIG. 11 illustrates an example of timing charts indicating signals froma light emission trigger signal generation unit according to the secondembodiment.

FIG. 12 schematically illustrates an example of the configuration of alaser controller and a laser apparatus according to a third embodiment.

FIG. 13 illustrates an example of timing charts indicating signals froma light emission trigger signal generation unit and a pulse laser beamin a laser apparatus according to the third embodiment.

FIG. 14 schematically illustrates an example of the configuration of alaser controller and a laser apparatus according to a fourth embodiment.

DETAILED DESCRIPTION

Hereinafter, selected embodiments of the present disclosure will bedescribed in detail with reference to the accompanying drawings. Theembodiments to be described below are merely illustrative in nature anddo not limit the scope of the present disclosure. Further, theconfiguration(s) and operation(s) described in each embodiment are notall essential in implementing the present disclosure. Note that likeelements are referenced by like reference numerals and characters, andduplicate descriptions thereof will be omitted herein.

Contents

-   1. Overview-   2. Terms-   3. Overview of EUV Light Generation System-   3.1 Configuration-   3.2 Operation-   4. Control of Target Supply Device and Laser Apparatus in EUV Light    Generation Apparatus-   4.1 Configuration of EUV Light Generation System-   4.2 Operation-   4.3 Issue-   5. Control of Light Emission Triggers to Laser Device-   5.1 First Embodiment-   5.2 Second Embodiment-   5.3 Third Embodiment (Laser Apparatus Including Optical Shutter)-   5.4 Fourth Embodiment (Laser Apparatus Including Pre-pulse Laser    Device)    1. Overview

In an LPP type EUV light generation system, a target supply device mayoutput a target and cause the target to reach a plasma generation regionwithin a chamber. By a laser device irradiating the target with a pulselaser beam at the point in time when the target reaches the plasmageneration region, the target can be turned into plasma and EUV lightcan be radiated from the plasma.

In the EUV light generation system, it can be required that EUV light begenerated over a predetermined time at a predetermined repetition rate.The predetermined repetition rate may be 100 kHz, for example. Thetarget supply device may output the targets at the stated predeterminedrepetition rate in order for the EUV light generation system to generatethe EUV light at the predetermined repetition rate.

The EUV light generation system may include a sensor for detecting thetargets outputted from the target supply device between the targetsupply device and the plasma generation region. The sensor may measurethe timing at which the targets pass. The EUV light generation systemmay output a pulse laser beam from the laser apparatus insynchronization with the timing at which the targets are detected by thesensor, and may irradiate the targets with the pulse laser beam.

By detecting the targets that pass through a predetermined position andoutputting a light emission trigger to the laser apparatus in accordancewith the timing at which the targets pass, the EUV light generationsystem can irradiate the targets with the pulse laser beam with a highlevel of precision at the point in time when the targets reach theplasma generation region.

However, the generation of the targets outputted from the target supplydevice can become unstable. Accordingly, a time interval over which thetargets are outputted can become longer or shorter than a predeterminedrange. Meanwhile, satellites can be generated when the targets aregenerated by the target supply device. “Satellites” are small dropletsthat have separated from the original target, and can be mistakenlydetected as targets by the sensor. Furthermore, in the case where thetarget material contains foreign objects, a flow rate of the targetmaterial can temporarily drop when such foreign objects traverse theinterior of a nozzle.

As a result, a time interval over which the pulse laser beam isoutputted can become longer or shorter. In the case with a time intervalover which the pulse laser beam is outputted is shorter than apredetermined range, the energy of the pulse laser beam can drop and thepulse waveform can become distorted. This can lead to a problem in thatthe target will not be turned into plasma correctly. Furthermore, in thecase where the time interval over which the pulse laser beam isoutputted is shorter than the predetermined range, laser oscillation canbecome unstable and the laser apparatus can be damaged.

On the other hand, in the case where a time interval over which thepulse laser beam is outputted is longer than the predetermined range,the energy of the pulse laser beam can rise and the pulse waveform canbecome distorted. This can cause greater fluctuations to occur in theenergy of the EUV light.

According to one aspect of the present disclosure, an EUV lightgeneration apparatus may generate and output a light emission triggerthat instructs a laser device included in a laser apparatus to emit apulse laser beam in accordance with a detection signal from a targetdetection unit indicating that a target has been detected. The EUV lightgeneration apparatus may adjust generation of the light emission triggeroutputted consecutively to the laser apparatus so that a time intervalof the light emission trigger is within a predetermined range.

2. Terms

Terms used in the present application will be described hereinafter. A“plasma generation region” can refer to a region where the generation ofplasma for generating EUV light begins. It can be necessary for a targetto be supplied to the plasma generation region and for a pulse laserbeam to be focused at the plasma generation region at the timing atwhich the target reaches the plasma generation region in order for thegeneration of plasma to begin at the plasma generation region. A “lightemission trigger” can be a signal instructing a laser device thatgenerates and emits (outputs) a laser beam to emit the laser beam. A“light emission trigger signal” can be a signal that contains the lightemission trigger and that changes over time.

3. Overview of EUV Light Generation System

3.1 Configuration

FIG. 1 schematically illustrates an exemplary configuration of an LPPtype EUV light generation system. An EUV light generation apparatus 1may be used with at least one laser apparatus 3. Hereinafter, a systemthat includes the EUV light generation apparatus 1 and the laserapparatus 3 may be referred to as an EUV light generation system 11. Asshown in FIG. 1 and described in detail below, the EUV light generationsystem 11 may include a chamber 2 and a target supply device 26. Thechamber 2 maybe sealed airtight. The target supply device 26 may bemounted onto the chamber 2, for example, to penetrate a wall of thechamber 2. A target material to be supplied by the target supply device26 may include, but is not limited to, tin, terbium, gadolinium,lithium, xenon, or any combination thereof.

The chamber 2 may have at least one through-hole or opening formed inits wall, and a pulse laser beam 32 may travel through thethrough-hole/opening into the chamber 2. Alternatively, the chamber 2may have a window 21, through which the pulse laser beam 32 may travelinto the chamber 2. An EUV collector mirror 23 having a spheroidalsurface may, for example, be provided in the chamber 2. The EUVcollector mirror 23 may have a multi-layered reflective film formed onthe spheroidal surface thereof. The reflective film may include amolybdenum layer and a silicon layer, which are alternately laminated.The EUV collector mirror 23 may have a first focus and a second focus,and may be positioned such that the first focus lies in a plasmageneration region 25 and the second focus lies in an intermediate focus(IF) region 292 defined by the specifications of an external apparatus,such as an exposure apparatus 6. The EUV collector mirror 23 may have athrough-hole 24 formed at the center thereof so that a pulse laser beam33 may travel through the through-hole 24 toward the plasma generationregion 25.

The EUV light generation system 11 may further include an EUV lightgeneration controller 5 and a target sensor 4. The target sensor 4 mayhave an imaging function and detect at least one of the presence,trajectory, position, and speed of a target 27.

Further, the EUV light generation system 11 may include a connectionpart 29 for allowing the interior of the chamber 2 to be incommunication with the interior of the exposure apparatus 6. A wall 291having an aperture 293 may be provided in the connection part 29. Thewall 291 may be positioned such that the second focus of the EUVcollector mirror 23 lies in the aperture 293 formed in the wall 291.

The EUV light generation system 11 may also include a laser beamdirection control unit 34, a laser beam focusing mirror 22, and a targetcollector 28 for collecting targets 27. The laser beam direction controlunit 34 may include an optical element (not separately shown) fordefining the direction into which the pulse laser beam 32 travels and anactuator (not separately shown) for adjusting the position and theorientation or posture of the optical element.

3.2 Operation

With continued reference to FIG. 1, a pulse laser beam 31 outputted fromthe laser apparatus 3 may pass through the laser beam direction controlunit 34 and be outputted therefrom as the pulse laser beam 32 afterhaving its direction optionally adjusted. The pulse laser beam 32 maytravel through the window 21 and enter the chamber 2. The pulse laserbeam 32 may travel inside the chamber 2 along at least one beam pathfrom the laser apparatus 3, be reflected by the laser beam focusingmirror 22, and strike at least one target 27 as a pulse laser beam 33.

The target supply device 26 may be configured to output the target(s) 27toward the plasma generation region 25 in the chamber 2. The target 27may be irradiated with at least one pulse of the pulse laser beam 33.Upon being irradiated with the pulse laser beam 33, the target 27 may beturned into plasma, and rays of light 251 including EUV light may beemitted from the plasma. At least the EUV light included in the light251 may be reflected selectively by the EUV collector mirror 23. EUVlight 252, which is the light reflected by the EUV collector mirror 23,may travel through the intermediate focus region 292 and be outputted tothe exposure apparatus 6. Here, the target 27 may be irradiated withmultiple pulses included in the pulse laser beam 33.

The EUV light generation controller 5 may be configured to integrallycontrol the EUV light generation system 11. The EUV light generationcontroller 5 may be configured to process image data of the target 27captured by the target sensor 4. Further, the EUV light generationcontroller 5 may be configured to control at least one of: the timingwhen the target 27 is outputted and the direction into which the target27 is outputted. Furthermore, the EUV light generation controller 5 maybe configured to control at least one of: the timing when the laserapparatus 3 oscillates, the direction in which the pulse laser beam 33travels, and the position at which the pulse laser beam 33 is focused.It will be appreciated that the various controls mentioned above aremerely examples, and other controls may be added as necessary.

4. Control of Target Supply Device and Laser Apparatus in EUV LightGeneration System

4.1 Configuration of EUV Light Generation System

FIG. 2 is a partial cross-sectional view illustrating the configurationof the EUV light generation system. As shown in FIG. 2, a laser beamfocusing optical system 22 a, the EUV collector mirror 23, the targetcollector 28, an EUV collector mirror holder 81, and plates 82 and 83may be provided within the chamber 2.

The plate 82 may be anchored to the chamber 2. The plate 83 may beanchored to the plate 82. The EUV collector mirror 23 may be anchored tothe plate 82 via the EUV collector mirror holder 81.

The laser beam focusing optical system 22 a may include an off-axisparaboloid mirror 221, a flat mirror 222, and holders 223 and 224. Theoff-axis paraboloid mirror 221 and the flat mirror 222 may be held bythe holders 223 and 224, respectively. The holders 223 and 224 may beanchored to the plate 83.

The positions and orientations of the off-axis paraboloid mirror 221 andthe flat mirror 222 may be held so that the pulse laser beam 33reflected by those mirrors is focused at the plasma generation region25. The target collector 28 may be disposed upon a straight lineextending from the trajectory of the target 27.

The target supply device 26 may be attached to the chamber 2. The targetsupply device 26 may include a reservoir 61. The reservoir 61 may hold atarget material that has been melted using a heater 261 shown in FIG. 3.An opening serving as a nozzle opening 62 may be formed in the reservoir61.

Part of the reservoir 61 may be inserted into a through-hole 2 a formedin a wall surface of the chamber 2 so that the nozzle opening 62 formedin the reservoir 61 is positioned inside the chamber 2. The targetsupply device 26 may supply the melted target material to the plasmageneration region 25 within the chamber 2 as droplet-shaped targets 27via the nozzle opening 62. A flange portion 61 a of the reservoir 61 maybe tightly fitted and anchored to the wall surface of the chamber 2 inthe periphery of the through-hole 2 a.

The target sensor 4 and a light-emitting section 45 may be attached tothe chamber 2. The target sensor 4 may include a photodetector 41, animage forming optical system 42, and a receptacle 43. The receptacle 43may be anchored to the outside of the chamber 2, and the photodetector41 and the image forming optical system 42 may be anchored within thereceptacle 43. The light-emitting section 45 may include a light source46, a focusing optical system 47, and a receptacle 48.

The receptacle 48 may be anchored to the outside of the chamber 2, andthe light source 46 and the focusing optical system 47 may be anchoredwithin the receptacle 48. Light outputted from the light source 46 canbe focused by the focusing optical system 47. The focal position of theoutputted light may be located substantially upon the trajectory of thetargets 27.

The target sensor 4 and the light-emitting section 45 may be disposedopposite to each other on either side of the trajectory of the targets27. Windows 21 a and 21 b may be provided in the chamber 2. The window21 a may be positioned between the light-emitting section 45 and thetrajectory of the targets 27.

The light-emitting section 45 may focus light at a predeterminedposition in the trajectory of the targets 27 via the window 21 a. Thewindow 21 b may be positioned between the trajectory of the targets 27and the target sensor 4. When the target 27 passes through the focalposition of the light emitted from the light-emitting section 45, thetarget sensor 4 may detect a change in the light passing through thetrajectory of the target 27 and the vicinity thereof and may output apassage timing signal as a target 27 detection signal. A singledetection pulse may be outputted as the passage timing signal each timea single target 27 is detected. The image forming optical system 42 mayform, upon a light-receiving surface of the target sensor 4, an image ofthe trajectory of the target 27 and the vicinity thereof, in order toimprove the accuracy of the detection of the target 27.

A position of the center of the target 27 detected by the target sensor4 will be referred to as a target detection position 40 in the followingdescriptions. In the example shown in FIG. 2, the target detectionposition 40 can substantially match the focal position of the lightemitted from the light-emitting section 45.

The laser beam direction control unit 34 and the EUV light generationcontroller 5 may be provided outside the chamber 2. The laser beamdirection control unit 34 may include high-reflecting mirrors 341 and342, as well as holders 343 and 344. The high-reflecting mirrors 341 and342 may be held by the holders 343 and 344, respectively. Thehigh-reflecting mirrors 341 and 342 may conduct the pulse laser beamoutputted by the laser apparatus 3 to the laser beam focusing opticalsystem 22 a via the window 21.

The EUV light generation controller 5 may receive an EUV lightgeneration signal from the exposure apparatus 6. The EUV lightgeneration signal may be a signal instructing the EUV light generationsystem 11 to generate EUV light during a predetermined time. The EUVlight generation controller 5 may carry out control operations foroutputting EUV light to the exposure apparatus 6 during the statedpredetermined time.

4.2 Operation

FIG. 3 is a block diagram illustrating control of the target supplydevice 26 and the laser apparatus 3 performed by the EUV lightgeneration controller 5. The EUV light generation controller 5 mayinclude a target supply controller 51 and a laser controller 55. Thetarget supply controller 51 may control operations performed by thetarget supply device 26. The laser controller 55 may control operationsperformed by the laser apparatus 3.

In addition to the reservoir 61 that holds the target material in amelted state, the target supply device 26 may include the heater 261, atemperature sensor 262, a pressure adjuster 263, a piezoelectric element264, and a nozzle 265.

The heater 261 and the temperature sensor 262 may be anchored to thereservoir 61. The piezoelectric element 264 may be anchored to thenozzle 265. The nozzle 265 may have the nozzle opening 62, shown in FIG.2, that outputs the target 27, which is liquid Sn, for example. Thepressure adjuster 263 may be provided in a pipe located between an inertgas supply section and the reservoir 61.

The target supply controller 51 may control the heater 261 based on avalue detected by the temperature sensor 262. For example, the targetsupply controller 51 may control the heater 261 so that the Sn withinthe reservoir 61 reaches a predetermined temperature greater than orequal to the melting point of the Sn. As a result, the reservoir 61 canmelt the Sn held therewithin. The predetermined temperature may be atemperature of 232° C. to 300° C., for example.

The target supply controller 51 may control a pressure within thereservoir 61 using the pressure adjuster 263. The pressure adjuster 263may adjust the pressure within the reservoir 61 under the control of thetarget supply controller 51 so that the targets 27 reach the plasmageneration region 25 at a predetermined velocity.

The target supply controller 51 may send an electrical signal having apredetermined frequency to the piezoelectric element 264. Thepiezoelectric element 264 can vibrate in response to the receivedelectrical signal, and can cause the nozzle 265 to vibrate at the statedfrequency.

As a result, the droplet-shaped targets 27 can be generated from a jetof the liquid Sn outputted from the nozzle opening 62 as a result of thepiezoelectric element 264 causing the nozzle opening 62 to vibrate. Thismethod for generating targets is sometimes referred to as the“continuous jet method”. In this manner, the target supply device 26 cansupply the droplet-shaped targets 27 to the plasma generation region 25at a predetermined velocity and a predetermined interval d. At thistime, a predetermined time interval T can be calculated using thepredetermined velocity and the predetermined interval d.

4.3 Issue

Satellites 271 may be produced when the target supply controller 51generates the droplet-shaped target 27. The satellites 271 may bedroplets, smaller than the target 27, that have separated from theoriginal target 27. The satellites 271 may be located immediately beforeor immediately after the original target 27 moving toward the plasmageneration region 25. The satellites 271 can be targets that are notdesirable.

In addition to the original target 27, the target sensor 4 may detectthe satellites 271 as targets as well, based on the light outputted bythe light-emitting section 45. By detecting the satellites 271 inaddition to the original target 27, the target sensor 4 may output adetection signal indicating that a target has been detected. Thedetection signal indicating that a target has been detected may be adetection pulse in a passage timing signal SA described below.

The target sensor 4 may output the detection signal indicating that atarget has been detected to the laser controller 55. As described above,the satellites 271 can reduce the time interval of the detection signal.Furthermore, in the case where the target material contains foreignobjects, a flow rate of the target material can temporarily drop whensuch foreign objects traverse the interior of the nozzle 265, which canincrease the output time interval of the targets 27. Accordingly, theoutput time interval of the targets 27 from the target supply controller51 can fluctuate, and the time interval of the detection signal can alsofluctuate in response thereto.

FIG. 4 schematically illustrates a comparative example of theconfiguration of the laser controller 55. The laser controller 55 mayinclude a light emission trigger controller 551 and a light emissiontrigger signal generation unit 552. The light emission trigger signalgeneration unit 552 may generate a light emission trigger signal SD thatis to be inputted to the laser apparatus 3, and may output the generatedsignal to the laser apparatus 3.

The light emission trigger signal generation unit 552 may include adelay circuit 564. An input of the delay circuit 564 may be connected tothe light emission trigger controller 551, and an output of the delaycircuit 564 may be connected to the laser apparatus 3. The lightemission trigger controller 551 may set a delay time td of the delaycircuit 564 in accordance with a delay time setting signal SDT. Thelight emission trigger controller 551 may receive the passage timingsignal SA from the target sensor 4 and output the received signal to thelight emission trigger signal generation unit 552.

The delay circuit 564 may receive the passage timing signal SA, generatethe light emission trigger signal SD by delaying the passage timingsignal SA by the delay time td, and output the light emission triggersignal SD to the laser apparatus 3. The light emission trigger signal SDmay contain a light emission trigger that instructs a laser deviceincluded in the laser apparatus 3 to emit a pulse laser beam. The lightemission trigger may be a light emission trigger pulse, which is a pulsesignal.

FIGS. 5A and 5B are examples of timing charts indicating signals fromthe light emission trigger signal generation unit 552. Specifically,FIGS. 5A and 5B are examples of timing charts indicating the passagetiming signal SA and the light emission trigger signal SD from the delaycircuit 564, respectively. As shown in FIGS. 5A and 5B, each pulse inthe light emission trigger signal SD can be delayed from thecorresponding pulses in the passage timing signal SA by the delay timetd.

In the case where the targets 27 are being supplied correctly, the timeinterval T of the detection pulses in the passage timing signal SA canbe within a predetermined range. In other words, Tmin≦T≦Tmax can holdtrue. The light emission trigger pulses in the light emission triggersignal SD can also be generated at the same cycle. The predeterminedrange for the time interval T of the detection pulse will be referred toas a “permissible range” hereinafter.

However, as described above, the time interval T of the detection pulsesin the passage timing signal SA can become shorter than Tmin or longerthan Tmax due to target generation abnormalities occurring as a resultof satellites being produced, the presence of foreign objects, and soon.

For example, in FIG. 5A, the time interval T between a pulse 501 and apulse 502 in the passage timing signal can be less than Tmin. Likewise,the time interval T between a pulse 505 and a pulse 506 can be less thanTmin. Due to the time interval of the pulses in the passage timingsignal SA, the time interval T between a pulse 531 and a pulse 515 inthe light emission trigger signal SD can be less than Tmin. Furthermore,the time interval T between a pulse 518 and a pulse 519 can be less thanTmin.

In FIG. 5B, the time interval T between a detection pulse 901 and adetection pulse 902 can be greater than Tmax. Due to the time intervalof the pulses in the passage timing signal SA, the time interval Tbetween a light emission trigger pulse 915 and a light emission triggerpulse 917 can be greater than Tmax.

As described above, in the case where the time interval of the lightemission trigger supplied to the laser apparatus 3 is outside thepermissible range (Tmin≦T≦Tmax), the energy and waveform of the pulselaser beam outputted from the laser apparatus 3 to the plasma generationregion 25 may change, and the energy of the EUV light may change greatlyas a result. The light emission trigger signal generation unit 552according to the present disclosure can generate the light emissiontrigger signal SD so that the output interval of the light emissiontrigger is within the permissible range, as will be describedhereinafter.

5. Control of Light Emission Triggers to Laser Device

5.1 First Embodiment

Configuration

FIG. 6 schematically illustrates an example of the configuration of thelaser controller 55 and the laser apparatus 3 according to the firstembodiment. The laser controller 55 according to the present embodimentmay, in the case where the time interval of sequential first and seconddetection pulses in the passage timing signal SA is less than apredetermined time, forego outputting a light emission trigger pulsecorresponding to the second detection pulse. Through this, fluctuationsin the pulse laser beam caused by a master oscillator 351 in the laserapparatus 3 having a short light emission interval can be suppressed.

The laser controller 55 may include the light emission triggercontroller 551 and the light emission trigger signal generation unit552. The light emission trigger signal generation unit 552 may include aone-shot circuit 561, an inverter 562, an AND circuit 563, and the delaycircuit 564. The light emission trigger signal generation unit 552 maygenerate the light emission trigger signal SD and output the generatedsignal to the laser apparatus 3.

The light emission trigger controller 551 may control the generation ofthe light emission trigger signal SD. The light emission triggercontroller 551 may set a pulsewidth Tsh of the one-shot circuit 561 viaa pulsewidth setting signal SPW. The light emission trigger controller551 may set the delay time td of the delay circuit 564 in accordancewith the delay time setting signal SDT. The light emission triggercontroller 551 may receive the passage timing signal SA from the targetsensor 4. Alternatively, the light emission trigger signal generationunit 552 may receive the passage timing signal SA without using thelight emission trigger controller 551.

An input of the one-shot circuit 561 may be connected to an output ofthe light emission trigger controller 551. The one-shot circuit 561 mayreceive the passage timing signal SA from the light emission triggercontroller 551. The one-shot circuit 561 may output a pulse signalhaving the pulsewidth Tsh in response to a falling edge of the inputsignal. An input of the inverter 562 may be connected to an output ofthe one-shot circuit 561.

One input of the AND circuit 563 may be connected to an output of theinverter 562. Another input of the AND circuit 563 may be connected toan output of the light emission trigger controller 551. The AND circuit563 may receive the passage timing signal SA from the light emissiontrigger controller 551. An input of the delay circuit 564 may beconnected to an output of the AND circuit 563. The delay circuit 564 mayoutput the light emission trigger signal SD to the laser apparatus 3.Details of the signals SA to SD in the light emission trigger signalgeneration unit 552 will be given later.

The laser apparatus 3 may include the master oscillator 351 as well as afirst amplifier 352, a second amplifier 353, and a third amplifier 354.The master oscillator 351 can be a laser device that generates andoutputs a pulse laser beam. The master oscillator 351, the firstamplifier 352, the second amplifier 353, and the third amplifier 354 maybe connected in series. The master oscillator 351 may be a CO₂ laserincluding a Q switch. The amplifiers 352 to 354 may be amplifiers thatcontain CO₂ laser gas. The number of amplifiers can depend on thedesign. The amplifiers 352 to 354 may be omitted.

Operation

Referring to FIG. 6, the light emission trigger controller 551 mayreceive the passage timing signal SA from the target sensor 4, and mayoutput the received signal to the one-shot circuit 561 and the ANDcircuit 563. For example, the one-shot circuit 561 may output a pulsehaving the pulsewidth Tsh at the falling edge of the passage timingsignal SA. In other words, the one-shot circuit 561 may detect a timingat which the passage timing signal SA changes from ON, which is ahigh-level, to OFF, which is a low-level, and may generate a pulseindicating the timing of that detection.

The inverter 562 may receive the signal outputted from the one-shotcircuit 561, and may generate an output signal SB by inverting thereceived signal. The output signal SB from the inverter 562 may beinputted to the AND circuit 563.

The AND circuit 563 may receive the passage timing signal SA from thelight emission trigger controller 551 and the output signal SB from theinverter 562. The AND circuit 563 may generate an AND signal SC from thereceived passage timing signal SA and the inverter output signal SB. TheAND signal SC outputted from the AND circuit 563 can be ON when both theinput signals SA and SB are ON, and can be OFF when at least one of theinput signals is OFF.

The AND circuit 563 may output the AND signal SC to the delay circuit564. The delay circuit 564 may generate the light emission triggersignal SD based on the AND signal SC and may output the generated signalto the master oscillator 351. The delay circuit 564 may output the lightemission trigger signal SD, which has been generated by delaying thereceived AND signal SC by the delay time td.

The light emission trigger signal SD may be a signal in which theprescribed delay time td has been applied to the AND signal SC. Thedelay time td can be a delay time that causes the pulse laser beam to befocused at the plasma generation region 25 at the timing at which thetarget 27 detected by the target sensor 4 reaches the plasma generationregion 25.

The delay time td can be applied using the following formula, forexample.td=L/v−αL may represent a distance from the target detection position 40 to acenter position of the plasma generation region 25. v may represent avelocity of the target 27. α may represent an amount of time from whenthe light emission trigger instructing the laser apparatus 3 to emit thepulse laser beam is outputted to when the pulse laser beam is focused atthe plasma generation region 25.

The master oscillator 351 of the laser apparatus 3 may receive the lightemission trigger signal SD from the delay circuit 564 of the lasercontroller 55. The master oscillator 351 may output the pulse laser beamin accordance with the light emission trigger signal SD. The masteroscillator 351 may output the pulse laser beam in response to, forexample, the falling edge of the pulse in the light emission triggersignal SD. The pulse of the light emission trigger signal can serve asthe light emission trigger instructing the master oscillator 351 to emit(output) the pulse laser beam.

The pulse laser beam outputted from the master oscillator 351 may beamplified by the first amplifier 352. The pulse laser beam amplified byand outputted from the first amplifier 352 may be further amplified bythe second amplifier 353, and the pulse laser beam amplified by andoutputted from the second amplifier 353 may be further amplified by thethird amplifier 354.

FIG. 7 is an example of timing charts indicating signals in the lightemission trigger signal generation unit 552. This timing chart exampleindicates relationships among the signals in the light emission triggersignal generation unit 552. Specifically, FIG. 7 illustrates timingcharts for the passage timing signal SA, the output signal SB from theinverter 562, the output signal SC from the AND circuit 563, and thelight emission trigger signal SD from the delay circuit 564.

Detection pulses 501 to 506 in the passage timing signal SA can serve asdetection signals indicating that a target has been detected. Thedetection pulses 501 and 503 to 505 can be pulses generated due to adesired target 27 being detected. On the other hand, the detectionpulses 502 and 506 can be pulses generated due to targets that aredifferent from the desired target 27 being detected. For example, thedetection pulse 502 can be a pulse generated due to a target whoseoutput is too early being detected, and the detection pulse 506 can be apulse generated due to a satellite being detected.

As described above, in the case where the targets 27 are being suppliedcorrectly, the time interval T of the detection pulses in the passagetiming signal SA can be within the permissible range. In other words,Tmin≦T≦Tmax can hold true. The light emission trigger pulses in thelight emission trigger signal SD can also be generated at the samecycle.

Tmin can be a minimum permissible value for the time interval of thelight emission trigger. Tmax can be a maximum permissible value for thetime interval of the light emission trigger.

On the other hand, as described above, the time interval T of thedetection pulses in the passage timing signal SA can become shorter thanTmin or longer than Tmax due to target generation abnormalities. In FIG.7, the time interval T between the detection pulse 501 and the detectionpulse 502 can be less than Tmin. Likewise, the time interval T betweenthe detection pulse 505 and the detection pulse 506 can be less thanTmin. As will be described later, the light emission trigger signalgeneration unit 552 can generate the light emission trigger signal SD sothat the output interval of the light emission trigger does not becomeless than Tmin.

The detection pulse 501 in the passage timing signal SA can have apulsewidth of Tw. Tw is a pulsewidth of a pulse generated when targets27 that have been correctly generated are detected. The output signal ofthe one-shot circuit 561 may change from OFF to ON at the falling edgeof the detection pulse 501. The inverter output signal SB may be asignal obtained by inverting the output signal from the one-shot circuit561. The inverter output signal SB may change from ON to OFF at thefalling edge of the detection pulse 501.

The falling edge of the detection pulse 502 in the passage timing signalSA can be present while the inverter output signal SB is OFF. Upondetecting the falling edge of the input signal, the one-shot circuit 561may reset a counter value for the pulsewidth Tsh. In other words, thepulsewidth Tsh of the output signal from the one-shot circuit 561 can beequivalent to an amount of time from the falling edge of the inputsignal SA immediately before.

A relationship of Tsh=Tmin−Tw, for example, may hold true for Tsh, Tmin,and Tw. The pulsewidth Tsh may be a value set in advance by a designer.The designer may determine Tmin and Tw in accordance with the systemconfiguration, and may then determine Tsh based on those values.

The output signal from the one-shot circuit 561 may change from ON toOFF when a time equivalent to Tsh has passed from the falling edge ofthe detection pulse 502. In other words, the inverter output signal SBmay change from OFF to ON when a time equivalent to Tsh has passed fromthe falling edge of the detection pulse 502. An amount of time from thefalling edge of the detection pulse 502 to a rising edge of a pulse 507in the inverter output signal SB may be equivalent to Tsh.

The AND circuit output signal SC can be ON when both the inverter outputsignal SB and the passage timing signal SA are ON. Accordingly, a pulse510 corresponding to the detection pulse 502 need not be generated.Likewise, the light emission trigger pulse 515 of the light emissiontrigger signal corresponding to the pulse 510 in the AND circuit outputsignal SC need not be generated.

The detection pulse 503 in the passage timing signal SA can be outputtedwhile the inverter output signal SB is ON. Accordingly, a pulse 511 ofthe AND circuit output signal SC can be generated from the detectionpulse 503.

Alight emission trigger pulse 516 of the light emission trigger signalSD can be generated from the pulse 511 in the AND circuit output signalSC. The light emission trigger pulse 516 can be delayed from the pulse511 in the AND circuit output signal SC by the delay circuit 564, by thedelay time td.

The inverter output signal SB may change from OFF to ON when a timeequivalent to Tsh has passed from the falling edge of the pulse 507. Anamount of time from the falling edge of the pulse 507 to the rising edgeof a pulse 508 in the inverter output signal SB may be equivalent toTsh. The inverter output signal SB may change from ON to OFF and formthe falling edge of the pulse 508 at the falling edge of the pulse 504in the passage timing signal SA.

The pulse 504 in the passage timing signal SA can be outputted duringthe time when the inverter output signal SB is ON. Accordingly, a pulse512 of the AND circuit output signal SC can be generated from the pulse504.

Alight emission trigger pulse 517 of the light emission trigger signalSD can be generated from the pulse 512 in the AND circuit output signalSC. The light emission trigger pulse 517 can be delayed from the pulse512 in the AND circuit output signal SC by the delay circuit 564, by thedelay time td.

A relationship among the pulses 505, 509, 513, and 518 can be the sameas a relationship among the pulses 504, 508, 512, and 517. Arelationship among the pulse 506, a pulse 514 that is not present, and apulse 519 that is not present can be the same as a relationship amongthe pulse 502, a pulse 510 that is not present, and a pulse 515 that isnot present.

Effect

According to the aforementioned configuration, the light emissiontrigger pulse can be suppressed from being outputted in the case wherethe time interval T of the detection pulses of the targets (droplets) isless than a minimum permissible value Tmin. As a result, a drop in thepulse energy and a change in the pulsewidth of the pulse laser beamoutputted from the laser apparatus 3 can be suppressed. This in turnmakes it possible to suppress fluctuations in the pulse energy of theEUV light and suppress the laser apparatus 3 from being damaged.

Other Configuration Example

FIGS. 8 and 9 illustrate an example of another configuration accordingto the first embodiment. The following descriptions will focus primarilyon points that are different from the configuration example describedwith reference to FIGS. 6 and 7. FIG. 8 schematically illustratesanother example of the configuration of the laser controller 55 and thelaser apparatus 3. FIG. 9 is an example of timing charts indicatingsignals in the light emission trigger signal generation unit 552according to the configuration example shown in FIG. 8.

Configuration

As shown in FIG. 8, the light emission trigger signal generation unit552 may include an AND circuit 566, a timer 567, an RS flip-flop 568,and a falling edge detection circuit 569 instead of the one-shot circuit561 and the inverter 562 indicated in the configuration example shown inFIG. 6. The light emission trigger controller 551 may set a set time inthe timer 567 using a timer setting signal ST. The set time may be Tmin.

An input of the falling edge detection circuit 569 may be connected toan output of the light emission trigger controller 551. The falling edgedetection circuit 569 may receive the passage timing signal SA from thelight emission trigger controller 551. The falling edge detectioncircuit 569 may output a pulse having a comparatively short pulsewidthin response to the falling edge of the input signal.

One input of the AND circuit 566 may be connected to an output of thefalling edge detection circuit 569. Another input of the AND circuit 566may be connected to an inverted Q terminal serving as an inverted outputof the RS flip-flop 568. An input of the timer 567 may be connected toan output of the AND circuit 566.

The timer 567 may start measuring time upon detecting the rising edge ofthe input signal as a trigger for starting time measurement. The timer567 may output a pulse when the set time has passed after the risingedge of the input signal. The set time may be Tmin. Upon detecting therising edge of the input signal while measuring the time, the timer 567may reset the time measurement value and begin measuring the time again.

An S terminal serving as a set input of the RS flip-flop 568 may beconnected to the output of the falling edge detection circuit 569. An Rterminal serving as a reset input of the RS flip-flop 568 may beconnected to an output of the timer 567. The inverted output of the RSflip-flop 568 may be connected to one of the inputs of the AND circuit563. An inverted output signal SF from the RS flip-flop 568 may beinputted to the AND circuit 563 and the AND circuit 566.

Operation

When a target is detected, the light emission trigger controller 551 mayreceive the passage timing signal SA and output a detection pulse. TheRS flip-flop 568 may output an ON signal, corresponding to the detectionpulse, to the AND circuit 563. The AND circuit 563 may generate a pulsebased on the ON signal from the RS flip-flop 568 and the pulse in thepassage timing signal SA, and may output the generated pulse to thedelay circuit 564.

The timer 567 may start measuring time in response to the detectionpulse in the passage timing signal SA. While the timer 567 is measuringtime, the RS flip-flop 568 may hold the OFF signal at the invertedoutput regardless of whether the input signal at the set input is ON orOFF. Accordingly, while the timer 567 is measuring time, the AND circuit563 and the delay circuit 564 may not generate the light emissiontrigger pulse even if a target is detected and the detection pulse inthe passage timing signal SA is inputted.

When the measured time reaches the set time, the timer 567 may output apulse. In response to a reset input signal changing from OFF to ON, theRS flip-flop 568 may change the inverted output signal inputted to theAND circuit 563 from OFF to ON. Thereafter, the AND circuit 563 and thedelay circuit 564 may generate and output the light emission triggerpulse when the detection pulse in the passage timing signal SA isinputted. Furthermore, the timer 567 may start measuring time.

An example of operations performed by the light emission trigger signalgeneration unit 552 according to this example will be described withreference to the block diagram in FIG. 8 and the timing chart in FIG. 9.As shown in FIG. 8, the light emission trigger controller 551 mayreceive the passage timing signal SA and output the detection pulse 501to the falling edge detection circuit 569 and the AND circuit 563. Theinverted output signal SF from the RS flip-flop 568 prior to a changemay be ON at the falling edge of the detection pulse 501.

The AND circuit 566 may receive the inverted output signal SF from theRS flip-flop 568 and the output signal from the falling edge detectioncircuit 569. The inverted output signal SF from the RS flip-flop 568prior to a change may be ON at the falling edge of the detection pulse501.

The falling edge detection circuit 569 may detect the falling edge ofthe detection pulse 501 and output a pulse 701. In other words, theoutput signal from the falling edge detection circuit 569 can changefrom OFF to ON. Accordingly, the AND circuit 566 can change its outputsignal from OFF to ON.

The timer 567 may start measuring time upon detecting a rising edge ofthe output signal from the AND circuit 566. The output signal from thetimer 567 may be OFF while the timer 567 is measuring time. In otherwords, the reset input signal of the RS flip-flop 568 may be OFF at thefalling edge of the pulse 501.

A set input signal of the RS flip-flop 568 maybe an output signal SGfrom the falling edge detection circuit 569. Accordingly, the set inputsignal SG of the RS flip-flop 568 can change from OFF to ON at thefalling edge of the detection pulse 501. As a result, the invertedoutput signal SF of the RS flip-flop 568 can change from ON to OFF.

The detection pulse 502 may be inputted before the time Tmin has passedfrom the pulse 501. The falling edge detection circuit 569 may detectthe falling edge of the detection pulse 502 and output a pulse 702. Theset input signal of the RS flip-flop 568 can change from OFF to ON.

The reset input signal of the RS flip-flop 568 is OFF, and the RSflip-flop 568 can hold the inverted output signal SF at OFF.Accordingly, the pulse 510 in the AND circuit output signal SC and thelight emission trigger pulse 515 in the light emission trigger signal SDthat correspond to the detection pulse 502 may not be generated.

The timer 567 may output a pulse when Tmin has passed from the fallingedge of the detection pulse 501. The reset input signal of the RSflip-flop 568 can change from OFF to ON. At this time, the set inputsignal of the RS flip-flop 568 can be OFF. The inverted output signal SFof the RS flip-flop 568 can change from OFF to ON, as indicated by arising edge 707. Thereafter, the set input signal of the RS flip-flop568 can change from ON to OFF when the detection pulse of the passagetiming signal SA is inputted.

After the inverted output signal SF of the RS flip-flop 568 has changedfrom OFF to ON, the pulse 503 of the passage timing signal SA may beinputted. Because the inverted output signal SF of the RS flip-flop 568is ON, the AND circuit 563 may generate the pulse 511 from the pulse 503and output the generated pulse 511.

The delay circuit 564 may generate the light emission trigger pulse 516,which is delayed from the pulse 511 by the delay time td, based on thepulse 511 in the AND circuit output signal SC, and may output thegenerated light emission trigger pulse 516 to the laser apparatus 3.

In FIG. 9, a relationship among the pulses 504, 704, 512, and 517 andthe operations performed by the light emission trigger signal generationunit 552 with respect to the generation of these pulses may be the sameas with the pulses 503, 703, 511, and 516. Likewise, a relationshipamong the pulses 505, 705, 513, and 518 and the operations performed bythe light emission trigger signal generation unit 552 with respect tothe generation of these pulses may be the same as with the pulses 503,703, 511, and 516.

Furthermore, a relationship among the pulses 506, 706, the pulse 514that is not present, and the pulse 519 that is not present, and theoperations performed by the light emission trigger signal generationunit 552 with respect to the generation of these pulses, may be the sameas with the pulses 502, 702, the pulse 510 that is not present, and thepulse 515 that is not present.

Effect

According to the aforementioned configuration, the light emissiontrigger pulse can be suppressed from being outputted in the case wherethe time interval T of the detection pulses of the targets is less thanthe minimum permissible value Tmin. As a result, a drop in the pulseenergy and a change in the pulsewidth of the pulse laser beam outputtedfrom the laser apparatus 3 can be suppressed. This in turn makes itpossible to suppress fluctuations in the pulse energy of the EUV lightand suppress the laser apparatus 3 from being damaged.

In the aforementioned configuration, after the light emission triggerpulse corresponding to a detection pulse has been generated, the nextlight emission trigger pulse can be generated in response to thedetection pulse that occurs immediately after Tmin, which is set in thetimer, has passed following the first detection pulse. Accordingly, thetime interval of the light emission trigger pulse can be suppressed frombecoming too long.

5.2 Second Embodiment

A second embodiment will be described with reference to FIGS. 10 and 11.The following will focus primarily on differences from the firstembodiment. In addition to the light emission trigger pulse outputted inresponse to the detection of a target including satellites, the lasercontroller 55 according to the second embodiment may generate a dummylight emission trigger pulse and output the dummy light emission triggerpulse to the laser apparatus 3. Through this, the stability of the pulselaser beam outputted from the laser apparatus 3 can be improved.

Configuration

FIG. 10 schematically illustrates an example of the configuration of thelaser controller 55 and the laser apparatus 3 according to the secondembodiment. In addition to the configuration shown in FIG. 6, the lightemission trigger controller 551 may include OR circuits 575 and 577 anda timer 576.

The timer 576 may output a pulse when a set amount of time has passedfollowing the detection of a measurement start trigger. The lightemission trigger controller 551 may set a set time in the timer 576using a timer setting signal ST2. The set time may be, for example, amaximum permissible time interval Tmax for the light emission triggerpulse outputted to the laser apparatus 3.

The timer 576 may start measuring time in response to the rising edge ofan input signal serving as the measurement start trigger, for example.Upon detecting the measurement start trigger while measuring the time,the timer 576 may reset the measurement time and then start the timemeasurement again.

One input of the OR circuit 575 may be connected to an output of thelight emission trigger controller 551, and another input of the ORcircuit 575 may be connected to an output of the timer 576. The passagetiming signal SA may be inputted to the OR circuit 575 from the lightemission trigger controller 551. An input of the timer 576 may beconnected to an output of the OR circuit 575.

One input of the OR circuit 577 may be connected to the output of thelight emission trigger controller 551, and another input of the ORcircuit 577 may be connected to the output of the timer 576. The passagetiming signal SA may be inputted to the OR circuit 577 from the lightemission trigger controller 551. An output of the OR circuit 577 may beconnected to the input of the one-shot circuit 561 and an input of theAND circuit 563.

As shown in FIG. 10, a former-stage circuit configured of the ORcircuits 575 and 577 and the timer 576 and a latter-stage circuitconfigured of the one-shot circuit 561, the inverter 562, and the ANDcircuit 563 may be connected in series.

Operation

Operations performed by the former-stage circuit configured of the ORcircuits 575 and 577 and the timer 576 will be described here.Operations performed by the latter-stage circuit are as described in thefirst embodiment with reference to FIGS. 6 and 7. The former-stagecircuit configured of the OR circuits 575 and 577 and the timer 576 maygenerate a dummy detection pulse and output the dummy detection pulse tothe latter-stage circuit when the set time set in the timer 576 haspassed from the previous detection pulse in the passage timing signalSA. Here, “dummy detection pulse” refers to a pulse generated withoutcorrespondence to the detection of a target including satellites.

FIG. 11 is an example of timing charts indicating signals in the lightemission trigger signal generation unit 552. Specifically, FIG. 11 is anexample of timing charts for the passage timing signal SA, an outputsignal SH from the OR circuit 577, the output signal SC from the ANDcircuit 563, and the light emission trigger signal SD.

When the detection pulse 901 of the passage timing signal is inputted,the OR circuit 577 may output a pulse 905 in the output signal SH. Inthe latter-stage circuit, the AND circuit 563 may output a pulse 910,corresponding to the pulse 905, in the output signal SC. The delaycircuit 564 may output the light emission trigger pulse 915 in which thepulse 910 is delayed.

The timer 576 may receive the detection pulse 901 via the OR circuit575. The timer 576 may start measuring the set time Tmax from the risingedge of the detection pulse 901. Upon receiving a new pulse during thetime measurement, the timer 576 may reset the measurement time and thenstart the time measurement again.

In the case where a new detection pulse in the passage timing signal SAis not inputted by the time the timer 576 finishes measuring the timeTmax, the timer 576 may output a pulse when the time measurement ends.The pulse from the timer 576 can be the dummy detection pulse.

The OR circuit 577 may output a pulse 906 corresponding to the dummydetection pulse from the timer 576. In the latter-stage circuit, the ANDcircuit 563 may output a pulse 911, corresponding to the pulse 906, inthe output signal SC. The delay circuit 564 may output a dummy lightemission trigger pulse 916, in which the pulse 911 is delayed, as adummy light emission trigger.

A relationship among the pulses 902, 907, 912, and 917 and theoperations performed by the light emission trigger signal generationunit 552 with respect to the generation of these pulses may be the sameas with the pulses 901, 905, 910, and 915.

Effect

As described in the first embodiment with reference to FIGS. 6 and 7,the one-shot circuit 561, the inverter 562, and the AND circuit 563 inthe aforementioned configuration can forgo outputting light emissiontrigger pulses corresponding to some target detection pulses. Throughthis, the time interval of the light emission trigger pulses can besuppressed from dropping below the minimum permissible value.

On the other hand, the OR circuits 575 and 577 and the timer 576 in theaforementioned configuration can generate the dummy light emissiontrigger pulse when the predetermined amount of time has passed from theoutput of the previous light emission trigger pulse. Through this, thetime interval of the light emission trigger pulses outputted to thelaser apparatus 3 can be suppressed from exceeding the maximumpermissible value. Thus, according to the configuration described in thepresent embodiment, the time interval T of the light emission triggerpulses can be held between the maximum permissible value and the minimumpermissible value.

Note that in the aforementioned exemplary configuration, thelatter-stage circuit that suppresses the time interval of the lightemission trigger pulses from dropping below the minimum permissiblevalue may be omitted. Even according to such a configuration, the timeinterval of the light emission trigger pulses can be held within a rangethat is no greater than the maximum permissible value. The latter-stagecircuit may have the configuration illustrated in FIG. 8.

5.3 Third Embodiment

A third embodiment will be described with reference to FIGS. 12 and 13.The following will focus primarily on differences from the secondembodiment. The EUV light generation system 11 according to the presentembodiment may block a pulse laser beam outputted in accordance with thedummy light emission trigger pulse. Through this, an undesirable pulselaser beam resulting from the dummy light emission trigger pulse can besuppressed from irradiating the plasma generation region 25.

Configuration

FIG. 12 schematically illustrates an example of the configuration of thelaser controller 55 and the laser apparatus 3 according to the thirdembodiment. In addition to the configuration shown in FIG. 10, the lightemission trigger controller 551 may include a one-shot circuit 581 andan inverter 582. In addition to the configuration shown in FIG. 10, thelaser apparatus 3 may include an optical shutter 355.

An input of the one-shot circuit 581 may be connected to the output ofthe timer 576. An output of the one-shot circuit 581 may be connected toan input of the inverter 582. An output of the inverter 582 may beconnected to an input of the optical shutter 355.

Upon detecting the rising edge of an input signal, the one-shot circuit581 may output a pulse having a pulsewidth Tsh2. The pulsewidth Tsh2 canindicate a time for which the pulse laser beam is to be blocked. Thepulsewidth Tsh2 may have a length equivalent to greater than or equal toan amount of time from when the rising edge is inputted to the one-shotcircuit 581 to when the output of a pulse laser beam from the amplifier354 resulting from the dummy light emission trigger pulse stops.

A value of the pulsewidth Tsh2 may be set in the one-shot circuit 581 inadvance. The light emission trigger controller 551 may set the value ofthe pulsewidth Tsh2 in the one-shot circuit 581.

The laser apparatus 3 may include the optical shutter 355, disposed inthe optical path of the pulse laser beam generated by the masteroscillator 351. The optical shutter 355 maybe disposed in, for example,the optical path of the pulse laser beam amplified by and outputted fromthe amplifier 354. Alternatively, the optical shutter 355 maybe disposedin the optical path of the pulse laser beam between the masteroscillator 351 and the amplifier 352, between the amplifier 352 and theamplifier 353, or between the amplifier 353 and the amplifier 354.

The optical shutter 355 may block the pulse laser beam by absorbing orreflecting the pulse laser beam. For example, the optical shutter 355may switch the optical path of the pulse laser beam between a firstoptical path and a second optical path (not shown) by switching betweentransmitting and reflecting the pulse laser beam.

The first optical path may be an optical path through which the pulselaser beam is focused at the plasma generation region 25. The secondoptical path may be an optical path through which the pulse laser beampasses outside the plasma generation region 25 and is absorbed in alaser damper (not shown). The optical shutter 355 may open and close theoptical path to the plasma generation region 25 by switching the opticalpath of the pulse laser beam in this manner.

When the optical shutter 355 is open, the pulse laser beam can passthrough the optical shutter 355 and advance along the first optical pathto the plasma generation region 25. When the optical shutter 355 isclosed, the pulse laser beam can be reflected by the optical shutter 355and advance along the second optical path. The optical shutter 355 maybe open when a control signal to the optical shutter 355 is ON, and maybe closed when the control signal to the optical shutter 355 is OFF. Thepulse laser beam can be blocked when the optical shutter 355 is closed.

The optical shutter 355 may have any configuration. For example, theoptical shutter 355 may be configured including a Pockels cell and apolarizer. The Pockels cell can function as a λ/2 plate under an appliedvoltage. The optical shutter 355 may be configured including anacousto-optic device and a piezoelectric element. The acousto-opticdevice may diffract the pulse laser beam in accordance with appliedvibrations.

Operation

As described in the second embodiment, the timer 576 may output a pulsein the case where the detection pulse interval T in the passage timingsignal is greater than Tmax. The pulse can be the dummy detection pulse.

The one-shot circuit 581 may receive the dummy detection pulse from thetimer 576. The one-shot circuit 581 may output a pulse having thepulsewidth Tsh2 in response to the rising edge of the dummy detectionpulse. The inverter 582 may invert and output the signal from theone-shot circuit 581.

The inverter 582 may output, to the optical shutter 355, a pulseobtained by inverting the pulse from the one-shot circuit 581 in anoptical shutter control signal SK. The inverted pulse inputted to theoptical shutter 355 can have the pulsewidth Tsh2. The optical shutter355 may be closed for the duration of the pulsewidth Tsh2 in which theinverted pulse is being received. The transmission of the pulse laserbeam can be suppressed by the closed optical shutter 355.

The dummy light emission trigger based on the dummy detection pulse fromthe timer 576 can be inputted to the master oscillator 351. The masteroscillator 351 can emit the pulse laser beam in response to the inputteddummy light emission trigger pulse. The pulse laser beam from the masteroscillator 351 can be amplified by the amplifiers 352 to 354, and theamplified pulse laser beam can then be outputted from the amplifier 354.The optical shutter 355 can be closed in accordance with the opticalshutter control signal SK from the inverter 582, and can suppress theamplified pulse laser beam from the amplifier 354 from passing.

On the other hand, in the case where the detection pulse interval T inthe passage timing signal SA is less than or equal to Tmax, the opticalshutter control signal SK can be ON, without the dummy detection pulsebeing outputted from the timer 576. In other words, the optical shutter355 can be open, and the amplified pulse laser beam from the amplifier354 can pass through the optical shutter 355.

FIG. 13 is an example of timing charts indicating signals in the lightemission trigger signal generation unit 552 and pulse laser beams in thelaser apparatus 3. In addition to the timing charts indicated in FIG.11, FIG. 13 indicates timing charts of a pulse laser beam LA outputtedfrom the master oscillator 351, the control signal SK inputted to theoptical shutter 355, and a pulse laser beam LB outputted from the laserapparatus 3 to the exposure apparatus 6.

In FIG. 13, the timing charts aside from the timing charts for themaster oscillator-emitted pulse laser beam LA, the optical shuttercontrol signal SK, and the output pulse laser beam LB are the same asthe timing charts indicated in FIG. 11. The master oscillator 351 mayoutput laser beam pulses 1101 to 1105 in response to the light emissiontrigger pulses 915 to 919, respectively.

The pulse 906 in the OR circuit output signal SH, the pulse 911 in theAND circuit output signal SC, the dummy light emission trigger pulse 916in the light emission trigger signal SD, and the laser beam pulse 1102in the master oscillator-emitted pulse laser beam LA can be generated inaccordance with the dummy detection pulse from the timer 576.

The optical shutter control signal SK can change from ON to OFF inaccordance with the dummy detection pulse from the timer 576. The timefor which the optical shutter control signal SK is OFF can be equivalentto the pulsewidth Tsh2 of the one-shot circuit 581. The laser beam pulse1102 in the master oscillator-emitted pulse laser beam LA can beoutputted while the optical shutter control signal SK is OFF, and canthus be blocked by the optical shutter 355. Accordingly, the outputlaser beam pulse from the laser apparatus 3 resulting from the laserbeam pulse 1102 from the master oscillator 351 can be suppressed.

Effect

According to the configuration described in the present embodiment, inthe case where the detection pulse interval T in the passage timingsignal SA is greater than Tmax, the master oscillator 351 can emit thepulse laser beam due to the dummy light emission trigger pulse. As aresult, fluctuations in the pulse laser beam from the master oscillator351 can be suppressed.

Furthermore, the pulse laser beam outputted from the master oscillator351 in response to the dummy light emission trigger pulse can be blockedby the optical shutter. As a result, the pulse laser beam can besuppressed from irradiating the plasma generation region 25 in responseto the dummy light emission trigger pulse. Through this, an increase indebris caused by the pulse laser beam outputted in response to the dummylight emission trigger pulse can be suppressed. In the case where gaspresent in the chamber 2, satellites of targets that have not beendetected, and so on are present in the plasma generation region 25,these items can produce plasma when irradiated with the pulse laserbeam, which in turn can produce debris. The debris may be fast ionsscattered from the plasma, scattered particles such as neutralparticles, or the like, and can spatter on or adhere to opticalcomponents such as the EUV collector mirror 23, causing a drop in theoptical performance thereof.

5.4 Fourth Embodiment

A fourth embodiment will be described with reference to FIG. 14. Thefollowing will focus primarily on differences from the third embodiment.The laser apparatus 3 according to the present embodiment may include apre-pulse laser device in addition to a main laser device.

The EUV light generation system 11 according to the present embodimentmay block a main pulse laser beam outputted from the main laser devicein response to the dummy light emission trigger pulse as well as apre-pulse laser beam outputted from the pre-pulse laser device inresponse to the dummy light emission trigger pulse. Through this, anundesirable pulse laser beam resulting from the dummy light emissiontrigger pulse can be suppressed from irradiating the plasma generationregion 25.

Configuration

FIG. 14 schematically illustrates an example of the configuration of thelaser controller 55 and the laser apparatus 3 according to the fourthembodiment. In addition to the configuration shown in FIG. 12, the laserapparatus 3 may include a pre-pulse laser device 361, an optical shutter362, a high-reflecting mirror 363, and a dichroic mirror 364. Thepre-pulse laser device 361 may be a solid-state laser device such as aYAG laser device.

In the present embodiment, the master oscillator 351 may be referred toas a main pulse laser device. An apparatus configured by and includingthe master oscillator 351, the amplifiers 352, 353, and 354, and theoptical shutter 355 will be referred to as a main pulse laser apparatus.A laser beam emitted from the master oscillator 351 and a beam obtainedby amplifying that laser beam may be referred to as the main pulse laserbeam.

Referring to FIG. 14, the optical shutter 355 may be disposed in anoptical path between the master oscillator 351 and the amplifier 352.The dichroic mirror 364 may be disposed in the optical path of the mainpulse laser beam. The main pulse laser beam may be incident on thedichroic mirror 364. The dichroic mirror 364 may allow the main pulselaser beam to pass through, at a high level of transmissibility, towardan optical path of the exposure apparatus 6.

The pre-pulse laser device 361 may output the pre-pulse laser beam. Thepre-pulse laser beam may contain a different wavelength component from awavelength component contained in the main pulse laser beam. The opticalshutter 362 may be disposed in an optical path of the pre-pulse laserbeam. Like the optical shutter 355, the optical shutter 362 may blockthe pre-pulse laser beam by switching the optical path of the pre-pulselaser beam in accordance with the optical shutter control signal SK.

The high-reflecting mirror 363 may be disposed in the optical path ofthe pre-pulse laser beam. The high-reflecting mirror 363 may reflect thepre-pulse laser beam at a high level of reflectance. The pre-pulse laserbeam reflected by the high-reflecting mirror 363 may be incident on thedichroic mirror 364. The dichroic mirror 364 may reflect the pre-pulselaser beam, at a high level of reflectance, toward the optical path ofthe exposure apparatus 6. The main pulse laser beam and the pre-pulselaser beam can both be conducted to the plasma generation region 25 as aresult. The dichroic mirror 364 may be disposed so that the opticalpaths of the pre-pulse laser beam and the main pulse laser beamsubstantially match.

In addition to the configuration shown in FIG. 12, the light emissiontrigger controller 551 may include a delay circuit 584. An input of thedelay circuit 584 may be connected to the output of the delay circuit564. An output signal from the delay circuit 584 may be inputted to themaster oscillator 351.

The output signal from the delay circuit 564 may be inputted to thepre-pulse laser device 361. A delay time of the delay circuit 584 can beequivalent to the time of a delay between the input of the lightemission trigger to the pre-pulse laser device 361 and the input of thelight emission trigger to the main pulse laser device. The lightemission trigger controller 551 may set a predetermined delay time inthe delay circuit 584.

An output of the inverter 582 may be connected to inputs of both theoptical shutters 355 and 362. The same optical shutter control signal SKmay be inputted to both the optical shutters 355 and 362. The opticalshutter control signal inputted to the optical shutter 355 may bedelayed from the optical shutter control signal inputted to the opticalshutter 362 by the predetermined delay time.

Operation

As described in the second embodiment, the timer 576 may output a pulsein the case where the detection pulse interval T in the passage timingsignal is greater than Tmax. The pulse can be the dummy detection pulse.

The one-shot circuit 581 may receive the dummy detection pulse from thetimer 576. The one-shot circuit 581 may output a pulse having thepulsewidth Tsh2 in response to the rising edge of the dummy detectionpulse. The inverter 582 may invert and output the signal from theone-shot circuit 581.

The inverter 582 may output, to the optical shutters 362 and 355, apulse obtained by inverting the pulse from the one-shot circuit 581 inthe optical shutter control signal SK. The inverted pulse inputted tothe optical shutters 362 and 355 can have the pulsewidth Tsh2.

The optical shutters 362 and 355 may be closed for the duration of thepulsewidth Tsh2 in which the inverted pulse is being received. Thetransmission of the main pulse laser beam and the pre-pulse laser beamcan be suppressed by the closed optical shutters 362 and 355. In otherwords, the main pulse laser beam and the pre-pulse laser beam can beblocked.

The dummy light emission trigger pulse corresponding to the dummydetection pulse from the timer 576 can be inputted to the pre-pulselaser device 361 and the master oscillator 351. The dummy light emissiontrigger pulse inputted to the master oscillator 351 may be delayed, bythe delay circuit 584, from the dummy light emission trigger pulseinputted to the pre-pulse laser device 361.

The pre-pulse laser device 361 can emit the pre-pulse laser beam inresponse to the inputted dummy light emission trigger pulse. The opticalshutter 362 can be closed in accordance with the optical shutter controlsignal SK from the inverter 582, and can suppress the pre-pulse laserbeam from the pre-pulse laser device 361 from passing.

The master oscillator 351 can emit the main pulse laser beam in responseto the inputted dummy light emission trigger pulse. The optical shutter355 can be closed in accordance with the optical shutter control signalSK from the inverter 582, and can suppress the main pulse laser beamfrom the master oscillator 351 from passing.

On the other hand, in the case where the detection pulse interval T inthe passage timing signal SA is less than or equal to Tmax, the opticalshutter control signal SK of the optical shutters 362 and 355 can be ON,without the dummy detection pulse being outputted from the timer 576. Inother words, the optical shutters 362 and 355 can be open, and the pulselaser beams from the pre-pulse laser device 361 and the masteroscillator 351 can pass through the optical shutters 362 and 355,respectively.

Effect

According to the configuration described in the present embodiment, inthe case where the detection pulse interval T in the passage timingsignal SA is greater than Tmax, the master oscillator 351 and thepre-pulse laser device 361 can emit the pulse laser beams in response tothe dummy light emission trigger pulse. Through this, fluctuations inthe pulse laser beams from the master oscillator 351 and the pre-pulselaser device 361 can be suppressed.

Furthermore, the pulse laser beams outputted from the master oscillator351 and the pre-pulse laser device 361 in response to the dummy lightemission trigger pulse can be blocked by the respective opticalshutters. As a result, the pulse laser beam can be suppressed fromirradiating the plasma generation region 25 in response to the dummylight emission trigger pulse. Through this, an increase in debris causedby the pulse laser beam outputted in response to the dummy lightemission trigger pulse can be suppressed.

The above-described embodiments and the modifications thereof are merelyexamples for implementing the present disclosure, and the presentdisclosure is not limited thereto. Making various modificationsaccording to the specifications or the like is within the scope of thepresent disclosure, and other various embodiments are possible withinthe scope of the present disclosure. For example, the modificationsillustrated for particular ones of the embodiments can be applied toother embodiments as well (including the other embodiments describedherein).

The configurations of the constituent elements illustrated in thedrawings and described in the aforementioned embodiments are merelyexamples, and the constituent elements may have other configurationsinstead. The aforementioned constituent elements, functions, and so onmay be partially or entirely realized through hardware, by appropriateelectrical circuit design or the like. Likewise, the aforementionedconstituent elements, functions, and so on may be realized throughsoftware, by a processor analyzing and executing programs that realizethose respective functions.

The configuration of a given embodiment can be partially replaced withthe configuration of another embodiment. The configuration of a givenembodiment can be added to the configuration of another embodiment.Parts of the configurations of the respective embodiments can be removedor replaced with other configurations, and other configurations can beadded thereto.

The terms used in this specification and the appended claims should beinterpreted as “non-limiting.” For example, the terms “include” and “beincluded” should be interpreted as “including the stated elements butnot limited to the stated elements.” The term “have” should beinterpreted as “having the stated elements but not limited to the statedelements.” Further, the modifier “one (a/an)” should be interpreted as“at least one” or “one or more.”

What is claimed is:
 1. An extreme ultraviolet light generation apparatusthat generates extreme ultraviolet light by irradiating a target with apulse laser beam and producing plasma, the apparatus comprising, achamber containing a plasma generation region irradiated by a pulselaser beam from a laser apparatus; a target supply device configured tosupply a plurality of targets consecutively to the plasma generationregion in the chamber; a target detection unit configured to detect atarget outputted from the target supply device that has passed apredetermined position between the target supply device and the plasmageneration region; and laser control circuitry configured to control thelaser apparatus, the laser control circuitry including a light emissiontrigger generation circuit configured to generate a light emissiontrigger instructing a laser device included in the laser apparatus toemit a pulse laser beam, and output the generated light emission triggerto the laser apparatus, the light emission trigger generation circuitincluding a first circuit configured to output a first signal thatchanges from OFF to ON after a first time has passed from a detectionsignal indicating target detection from the target detection unit, and afirst AND circuit configured to output an AND signal of the first signaland the detection signal, the light emission trigger generation circuitoutputting the light emission trigger to the laser apparatus based on anoutput from the first AND circuit, and the laser control circuitryoutputting the light emission trigger to the laser apparatus in responseto a next detection signal received immediately after the first time haspassed following the detection signal.
 2. The extreme ultraviolet lightgeneration apparatus according to claim 1, wherein the first circuitincludes a falling detection circuit configured to detect falling of thedetection signal from the target detection unit.
 3. The extremeultraviolet light generation apparatus according to claim 1, wherein theemission trigger generation circuit includes a delay circuit configuredto generate the light emission trigger based on the AND signal from thefirst AND circuit.
 4. The extreme ultraviolet light generation apparatusaccording to claim 1, wherein the laser control circuitry includes alight emission trigger control circuit configured to transfer thedetection signal from the target detection unit to the first ANDcircuit.
 5. An extreme ultraviolet light generation apparatus thatgenerates extreme ultraviolet light by irradiating a target with a pulselaser beam and producing plasma, the apparatus comprising, a chambercontaining a plasma generation region irradiated by a pulse laser beamfrom a laser apparatus; a target supply device configured to supply aplurality of targets consecutively to the plasma generation region inthe chamber; a target detection unit configured to detect a targetoutputted from the target supply device that has passed a predeterminedposition between the target supply device and the plasma generationregion; and laser control circuitry configured to control the laserapparatus, the laser control circuitry including a light emissiontrigger generation circuit configured to generate a light emissiontrigger instructing a laser device included in the laser apparatus toemit a pulse laser beam, and output the generated light emission triggerto the laser apparatus, the light emission trigger generation circuitincluding a first circuit configured to output a first signal thatchanges from OFF to ON after a first time has passed from a detectionsignal indicating target detection from the target detection unit, and afirst AND circuit configured to output an AND signal of the first signaland the detection signal, the light emission trigger generation circuitoutputting the light emission trigger to the laser apparatus based on anoutput from the first AND circuit, and the first circuit including aone-shot circuit configured to output a pulse of a predetermined pulsewidth in accordance with a detection signal from the target detectionunit and an inverter configured to invert output from the one-shotcircuit and output the inverted output to the first AND circuit.
 6. Anextreme ultraviolet light generation apparatus that generates extremeultraviolet light by irradiating a target with a pulse laser beam andproducing plasma, the apparatus comprising, a chamber containing aplasma generation region irradiated by a pulse laser beam from a laserapparatus; a target supply device configured to supply a plurality oftargets consecutively to the plasma generation region in the chamber; atarget detection unit configured to detect a target outputted from thetarget supply device that has passed a predetermined position betweenthe target supply device and the plasma generation region; and lasercontrol circuitry configured to control the laser apparatus, the lasercontrol circuitry including a light emission trigger generation circuitconfigured to generate a light emission trigger instructing a laserdevice included in the laser apparatus to emit a pulse laser beam, andoutput the generated light emission trigger to the laser apparatus, thelight emission trigger generation circuit including a first circuitconfigured to output a first signal that changes from OFF to ON after afirst time has passed from a detection signal indicating targetdetection from the target detection unit, and a first AND circuitconfigured to output an AND signal of the first signal and the detectionsignal, the light emission trigger generation circuit outputting thelight emission trigger to the laser apparatus based on an output fromthe first AND circuit, and the first circuit including a timer tomeasure the first time and a second circuit configured to output an OFFsignal to the first AND circuit while the timer measures the first timeand an ON signal to the first AND circuit after the timer measures thefirst time.
 7. The extreme ultraviolet light generation apparatusaccording to claim 6, wherein the first circuit includes a fallingdetection circuit configured to detect falling of the detection signalfrom the target detection unit.
 8. The extreme ultraviolet lightgeneration apparatus according to claim 7, wherein the first circuitincludes a second AND circuit configured to output an AND signal to thetimer based on the detection signal.
 9. The extreme ultraviolet lightgeneration apparatus according to claim 8, wherein the second circuit isa flip-flop circuit.
 10. The extreme ultraviolet light generationapparatus according to claim 9, wherein the timer is configured tooutput the ON signal to the second circuit to invert output of thesecond circuit after the timer measures the first time.
 11. The extremeultraviolet light generation apparatus according to claim 10, whereinthe timer is configured to reset measurement of the first time upondetecting a next detection signal while the timer measures the firsttime.
 12. The extreme ultraviolet light generation apparatus accordingto claim 10, wherein the emission trigger generation circuit includes adelay circuit configured to generate the light emission trigger based onthe AND signal from the first AND circuit.
 13. The extreme ultravioletlight generation apparatus according to claim 10, wherein the lasercontrol circuitry includes a light emission trigger control circuitconfigured to transfer the detection signal from the target detectionunit to the first AND circuit and output a time setting signal forsetting the timer.
 14. The extreme ultraviolet light generationapparatus according to claim 10, wherein the falling detection circuitis configured to detect an edge of the detection signal.
 15. The extremeultraviolet light generation apparatus according to claim 7, wherein thesecond circuit is a flip-flop circuit.
 16. The extreme ultraviolet lightgeneration apparatus according to claim 7, wherein the timer isconfigured to output a signal for inverting output from the secondcircuit to the second circuit after the timer measures the first time.17. The extreme ultraviolet light generation apparatus according toclaim 7, wherein the timer is configured to output the ON signal to thesecond circuit to invert output of the second circuit after the timermeasures the first time.
 18. The extreme ultraviolet light generationapparatus according to claim 6, wherein the emission trigger generationcircuit includes a delay circuit configured to generate the lightemission trigger based on the AND signal from the first AND circuit. 19.The extreme ultraviolet light generation apparatus according to claim 6,wherein the laser control circuitry includes a light emission triggercontrol circuit configured to transfer the detection signal from thetarget detection unit to the first AND circuit and output a time settingsignal for setting the timer.